Views: 0 Author: Site Editor Ɣeyiɣi si wotae: 2026-07-14 Dzɔtsoƒe: Teƒe
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Wowɔa MQsiliconeresi nye nusi wotsɔna ƒoa ƒui kple nusi doa ŋusẽ ame, si dzia MQ/gumratioto1.2:1–2:1(si kɔ ŋutɔ wu esiwo wozãna ɖaa).ThishighMQratioformcontinuous rigid'hard-phase'microdomainwithinheadhesivelayer, si xea mɔ na siloxanechainsegments ƒe ʋuʋu eye wònaa storagemodulus la nyona ɖe edzi ŋutɔ eye wònana dzoxɔxɔ si kɔ wu la te ŋu nɔa te ɖe enu.
Wotsɔa phenyl,diphenyl,alo carboranegroups dea polydimethylsiloxanebackbone(le kpɔɖeŋu me, 20–30mol%phenyl content) me be wòaxe mɔ ɖe dzoxɔxɔ ƒe kɔsɔkɔsɔ ƒe ʋuʋu nu eye wòana glass ƒe dzoxɔxɔ kple dzoxɔxɔ siaa nado rmaldecompositiontemperature.Crosslinkingsystem la lɔ̃a zãaddition-curehydrosilylation(Pt-catalyzed),wɔa–C–C–alo–Si–C–crosslinkingbridge kple dzoxɔxɔ ƒe liƒo si de ŋgɔ wu.
To asitɔtrɔ le haidrodzin si le dɔ wɔm kple kɔsɔkɔsɔ ƒe didime si le siliconeoil si me haidrodzin le ŋu pɛpɛpɛ me la, wokpɔ Mc (si ade 5,000–15,000g/mol) si sɔ gbɔ vie, si na wokpɔ egbɔ be net dɔwɔwɔ léa tenɔnɔ ɖe nɔnɔme sesẽwo nu si lolo wu ɖe dzoxɔxɔ sesẽwo me.Extended post-curingorhigh-temperatureannealingisad to consumeresidual reactiongroups eye wòhea ŋusẽ ƒe ɖiɖiɖeme si network ƒe gbagbãwo he vɛ.
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Woawoe nye silika si me dzudzɔ le (anyigba ƒe teƒe tɔxɛ si nye200–380m²/g), si wotsɔ vinyltriethoxysilaneor hexamethyldisilazane wɔ dɔe le anyigba dzi, si nye agba si nye 10–25wt% reversiblephysicalcrosslinkingnetwork si tsɔa ŋusẽ ƒua gbe eye wòxea mɔ na molecule chains lippage le dzoxɔxɔ sesẽwo dzi.High-sheard dispersion kpɔa egbɔ be silica la li'clusters'si ƒe lolome le 100nm te, si ƒoa asa na nuteɖeamedzi ƒe ƒoƒo ɖekae.
1–5wt% ʋee-layergraphene aloorgano-modifiednano-montmorillonite, si ƒe nɔnɔme le ɖoɖo nu to shear-induced alignment le nutsyɔnu me, kpe ɖe eŋu, ewɔa 'mazeeffect'parallel to the tape lane,si dzia tsitretsitsi ɖe molecule ƒe kɔsɔkɔsɔ ƒe ʋuʋu ŋu ɖe edzi ŋutɔ.
Wotsɔa sodium–naphthalene–THFsolution alo argon/oxygenplasma si ƒe nyaƒoɖeamenu suewo wɔa dɔ na PTFE ƒe anyigba gbã be wòawɔ ƒuƒoƒo si wowɔ dɔ si me carboxylandhydroxylgroups le ated.Onendoftheprimerreactwith–OH/–COOHonthePTFEsurface, whiletheotherend participate in hydrosilylation or condensationcrosslinkingwith the siliconneadhesive,wɔa atikewo ƒe kadodo si gena ɖe ƒomedodoa me.Ateteɖeanyi sia ate ŋu adzi dzoxɔxɔ si kɔkɔ ƒe ŋusẽ si léa nu ɖe te (le 260°C) ɖe edzi zi gbɔ zi 3–5.
Wozãa Arampedcuringprofile:gbã la, woɖea solvents ɖa eye wotsɔa adhesive layeris leveled le 80–100°C;emegbe hydrosilylation kple backing of MQresina wowu enu le150–170°C;mlɔeba, post -curingiscarriedoutat200–220°Cforsegeuralhours to eternalstressandstabilize physicalcrosslinkingpoints.Fafa blewu xea mɔ na nu suesuesuewo ƒe gbagbã le dzoxɔxɔ ƒe vovototodedeameme ta.
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