Dimanufakchur dεn de mek MQsilikonεrεsin as di kכrεtakfaya εn infכs εjεnt, we de inkrεs di MQ/gumrεshכn1.2:1–2:1(signifikantli hεy pas kכnvεnshכnalgrεd dεm).ThishighMQrεshכn fכm kכntinyu rigid'had-phase'maykrodomɛn dɛn wit di ed hεsiv layt, we de kɔnstrayn di muvmɛnt fɔ saylɔksan chen sɛgmɛnt ɛn sɔbstanshal impruv di stɔrɔj mɔdyul ɛn kri prɛsistɛns pan ɛlevɛt tɛmpracha.
Fɛnil,difenil, ɔ kabɔran grup dɛn kin introduks insay di polidimɛtilsilɔksan bakbon(ɛgz., 20–30mol%fenilkɔntinɛnt) fɔ mek i nɔ ebul fɔ mek di tɛmral chen muv ɛn i kin mek ɔl tu di glasstransishɔn tɛmpracha ɛn di rmaldecompositiontemperature.Di kroslinkinsistimpreferentiallyemploysaddition-curehydrosilylation(Pt-catalyzed),fom–C–C–or–Si–C–kroslinkinbrijwit supiriorthermalstability.
bay we dεn adjɔst di aktv haydrojen kכntεnεnt εn chen lεngth כf di haydrojεn-kכntεn silikonכyכl, na rεlativ sכm lεnd yunifכmMc(aprכksimatli 5,000–15,000g/mol) dεn achiv, εnshכr se dεn nεt wokmaintainshigh resilienceevenathight temperature.Ekstend post-curingor high-temperatureannealingisapplied to konsumer rεsidyual riaktiv grup dεm εn dεdyus εstrεs rilaksεshכn we dεn kכz bay nεtwכkdεfεkt dεm.
3.Viscoelasticfunctionallayer(incontactwiththeadherend,3–8μm): Employslow-MQ-ratioorhydroxy-terminatedsilikon-oil-modified softsiliconeadhesivetolowersurfacemodulusandensurerapidwetin ɛn kɔnfɔmabiliti to di edherendatelevated tɛmpracha.
Di mεnεkshכn de fכm silika(spεsifi k sכfayz εria200–380m²/g), sכfa-trit wit vinyltriεtoksisilεn כ hεksamεtyl disilazεn, atalod כf10–25wt%.Tεnano-SiO2 fכm haydrojen bכnd εn fizikal adsכpshכn wit siloksan chen, we de mek wan rivεrsibl fyzikal krכslinkεn nεtwכk we de dissipεt εnεji εn prεvεnt mכlikul chen dεm we de slip na tayt tεmprachכ.Hay-shid dispεshכn de mek sכh se di silika de na 'klכsta'wit glכmεrayt saiz dεn dכn 100nm, we de avכyd strεs kכnsantreshכn.
2.DayrεkshכnalKrεpRεsistεnsvia2DNanomaterials
Addishכn כf1–5wt% fכ-layεrgrafεn כ כrgano-mכdifεd nano-mכnt mכrilכnayt, we de כriεnt in layεr dεrεnjmεnt tru shia-indyus alaynsmεnt di tεm we dεn de kכt, fכm'mazεfεkt'paralel to di tεp len, signifikantli inkrεs rεsistεnsto mכlikul chen mכshכn insay di shia dεyrekshכn.Grafin dεm de fכs εksεlεnt tεmכl kכnduktiviti, we de ridyus hכtpכt dεm na di adhesive layεr εn de lay tεmכl sכftin.
di PTFEsurface na fכs trit wit sodyכm–naftalin–THFsכlushכn כ lכw-prεshכn argon/כksijεnplasmat fכ jεnarεt wan aktibכt layεr we gεt kכbכksilandhaydroksylgrכp ated.Wan pan di prayma riak wit–OH/–COOHon di PTFEsurface, we di ɔda ɛnd de patisipet insay haydrosilyleshɔn ɔ kɔndɛnseshɔn krɔslink wit di silikon adhesive, fɔm wan kemikal bɔndnɛtwɔk we de go insay di intafɛs.Dis aprɔch kin inkrisayz ay-tɛmpracha holdin pawa(na 260°C) bay 3–5 tɛm.
