Di manufakchur dεptsMQsilikonεrεsin as di kכrtakfaya εn infכsεjεnt, inkrεs di MQ/gumrεshכn1.2:1–2:1(signifikantli hεy pas kכnvεnshכnalgrεd dεm).ThishighMQrεshכn fכm kכntinyu rigid'had-phase'maykrodomɛn dɛn wit di ed hɛsiv layt, we de kɔnstrayn di muvmɛnt fɔ saylɔksan chen sɛgmɛnt dɛn ɛn sɔbstanshal impruv di stɔrɔj mɔdyul ɛn kri prɛsistɛns pan ɛlevɛt tɛmpracha.
Fɛnil,difenil, ɔ kabɔran grup dɛn kin introduks insay di polidimɛtilsilɔksan bakbon(ɛgz., 20–30mol%fɛnilkɔntinɛnt) fɔ mek i nɔ ebul fɔ mek di tɛmral chen muv ɛn i kin mek ɔl tu di glasstransishɔn tɛmpracha ɛn di rmaldecompositiontemperature.Di kroslinkinsistimpreferentiallyemploysaddition-curehydrosilylation(Pt-catalyzed),fom–C–C–or–Si–C–kroslinkinbrijwit supiriorthermalstability.
bay we dεn prεsis adjכst di aktv haydrojen kכntεnεnt εn chen lεngthכf di haydrojen-kכntεn silikonכyl, na rεlativ sכm lεnd yunifכmMc(aprכksimatli 5,000–15,000g/mol) dεn achiv, εnshכr se dεn nεt wokmaintainshigh resilienceevenathight temperature.Ekstended post-curingor high-temperatureannealingisapplied to konsumer rεsidyual riaktiv grup εn dεn dכn εstrεs rilaksεshכn we dεn kכz bay nεtwכkdεfεkt.
3.Viscoelasticfunctionallayer(incontactwiththe adherend,3–8μm): Employslow-MQ-ratioorhydroxy-terminatedsilicon-oil-modified softsiliconeadhesivetolowersurfacemodulusandensurerapidwetin ɛn kɔnfɔmabiliti to di edherendatelevated tɛmpracha.
Di mεnεkshכn de fכm silika(spεsifi k sכfεs εria200–380m²/g), sכfa-trit wit vεnyltriεtoksisilεn כ hεksamεtyl disilazan, atalod כf10–25wt%.Tεnano-SiO2 fכm haydrojen bכnd εn fizikal adsכpshכn wit siloksan chen, we de mek wan rivεrsibl fyzikal krכslinkin nεtwכk we de dissipεt εnεji εn prεvεnt mכlikul chen dεm we de slip na di tεmprachכ.Hay-shid dispεshכn de mek sכh se di silika de na 'kכlכsta'wit glכmεrayt saiz dεn dכn 100nm, we de avכyd strεs kכnsantreshכn.
2.DayrεkshכnalKrεpRεsistεnsvia2DNanomaterials
Addishכn כf1–5wt% fכ-layεrgrafεn כ כrgano-modifyεd nano-mכnt mכrilכnayt, we de כriεnt inlayεr dεrεnjmεnt tru shia-indyus alaynsmεnt we dεn de kכt, fכm'mazεfεkt'paralel to di tεp len, signifikantli inkrεs rεsistεnsto mכlikul chen mכshכn insay di shia dεyrekshכn.Grafin dεm de fכs εksεlεnt tεmכl kכnduktiviti, we de ridyus hכtpכt dεm na di adhesive layεr εn de lay tεmכl sכftin.
di PTFEsurface na fכs trit wit sodyכm–naftalin–THFsכlushכn כ lכw-prεshכn argon/כksijεnplasmat fכ jεnarεt wan aktibכt layεr we gεt kכbכksilandhaydroksilgrכp ated.Wan pan di prayma riak wit–OH/–COOHon di PTFEsurface, we di ɔda ɛnd de patisipet insay haydrosilyleshɔn ɔ kɔndɛnseshɔn krɔslink wit di silikon adhesive, fɔm wan kemikal bɔndnɛtwɔk we de go insay di intafɛs.Dis aprɔch kin inkrisayz di ay-tɛmpracha holdin pawa(na 260°C) bay 3–5 tɛm.
